Characterization of Plasma Polymerized Hexamethyldisiloxane Films Prepared by Arc Discharge.

Herein, we present a simple method for fabricating plasma polymd. hexamethyldisiloxane films (pp-HMDSO) possessing superhydrophobic characteristics via arc discharge. The pp-HMDSO films were deposited on a soda-lime-silica float glass using HMDSO monomer vapor as a precursor. A detailed surface characterization was performed using SEM and at. force microscopy. The growth process of the pp-HMDSO films was investigated as a function of deposition time from 30 to 300 s. The non-wetting characteristics of the pp-HMDSO films were evaluated by means of contact angle (CA) measurements and correlated with the morphol. characteristics, as obtained from microscopy measurements. The deposited films were found to be nano-structured and exhibited dual-scale roughness with the static CA values close to 170°. Fourier transform IR spectroscopy anal. was carried out to investigate chem. and functional properties of these films. Me groups were identified spectroscopically to be present within the pp-HMDSO films and were proposed to result in the low surface energy of material. The synergy between the dual-scale roughness and low surface energy resulted in the superhydrophobic characteristics of the pp-HMDSO films. A possible mechanism for the pp-HMDSO film formation is proposed. [on SciFinder(R)]